Veeco: HB LED MaxBright GaN production MOCVD

Days ago, Veeco announced the introduction of the TurboDisc R MaxBright gallium nitride (GaN) metal organic chemical vapor deposition (MOCVD) multi reactor system, the production of HB led for.

Veeco, two or four MaxBright reactor using Veeco FlowFlange & reg cluster architecture automation technology and expertise in a modular by combining a plurality of new, high-throughput, metal organic chemical vapor deposition reactor.

The MaxBright reactor, after verification of production on the basis of K465i, it is necessary to expand the wafer production capacity and advanced, proprietary, closed loop thermal control technology, while expanding the quality uniformity, repeatability and material. MaxBright MOCVD system can provide a production capacity of 216 * 2, 56 * 4, 24 * 6 or 12 x 8 wafer. In addition, seamless transfer of K465i formula MaxBright allows customers to achieve rapid production.

At the same time, Veeco stakeholders pointed out that MaxBright's value proposition is clear: it is the highest productivity MOCVD system manufacturing high brightness LED market. The architecture supports a single cavity or multi cavity layer growth capability to improve the flexibility of the LED structure process requirements. The compact framework MaxBright also allows a separate metal organic chemical vapor deposition system footprint efficiency gain up to 2.5 times. Overall, the MaxBright provides 500% of the added value of the K465i in a compact package with flexible. "