Ritsumeikan University days ago published a communique, the researchers have developed a way to produce a low cost and efficient deep ultraviolet light emitting diode (LED) technology, is expected to become the deep ultraviolet light after the United Nations to limit the use of mercury is widely used.
Ultraviolet light in the wavelength of 200 nm to 350 nm is known as deep ultraviolet light, is widely used in water purification plants, hospitals, factories clean air sterilization workshop, formaldehyde and other fields. In the past, a lot of deep ultraviolet light using a mercury lamp, but the United Nations Organization last year signed the "Minamata Convention" provisions to greatly restrict the use of mercury, it is necessary to develop alternative sources.
Deep UV LED can be used to replace the mercury lamp, but in the past when making deep UV LED to use expensive sapphire substrate, its high cost limits the popularity of. Aoyagi Konobu et al reported senior researcher at Ritsumeikan University said, can use cheap silicone instead of sapphire as a substrate, which can significantly reduce costs.
In addition, in order to allow the current to pass through in the past, a part of the insulating layer on the substrate is needed to be peeled off. The new method is to attach a layer of aluminum nitride on the silicon substrate as an insulator, and then open a number of holes above the current through. This does not need to peel off the insulation layer, greatly shorten the process, the need for 5 days before the production can be shortened to 1 days, and to avoid the delamination of the insulation layer on the LED damage, luminous efficiency has been improved.
The team believes that the new method can greatly reduce the manufacturing cost of deep UV LED, is expected to promote the production of such a deep ultraviolet light source and extensive application.
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