Japan Institute of comprehensive utilization of Ace's powerful system on the success of the 300mm wafer Shi Moxi

German Ace strong Limited by Share Ltd today announced that its BM 300 system in Japan's Industrial Technology Research Institute (AIST) successfully put into use. The system was installed in 2011 in the AIST Research Institute, located in the city of Tsukuba clean room, and by Ace strong local service support team for debugging. AIST research team leader Misaki Sato Shintaro (Shintaro Sato) Dr. at the April 10, 2012 American Association of materials spring conference, published the results of the experimental growth.

"AIST in 300mm wafer grown monolayer graphene, for us is an important milepost," Dr. Ace nanotechnology equipment director Ken Teo said, "BM is the 300 technology the most advanced graphene production platform, has the ability to accurately conveying material pre mature gas in situ wafer heat distribution system and ARGUS control, a highly uniform wafer heater, automatic processor etc.. Graphene deposition in 300mm wafer is highly controllable and repeatable, is the necessary steps of large-scale wafer production of graphene, graphene and laid the foundation for the development of a new generation of semiconductor devices with unique properties. "

"AIST in 300mm wafer grown monolayer graphene, for us is an important milepost," Dr. Ace nanotechnology equipment director Ken Teo said, "BM is the 300 technology the most advanced graphene production platform, has the ability to accurately conveying material pre mature gas in situ wafer heat distribution system and ARGUS control, a highly uniform wafer heater, automatic processor etc.. Graphene deposition in 300mm wafer is highly controllable and repeatable, is the necessary steps of large-scale wafer production of graphene, graphene and laid the foundation for the development of a new generation of semiconductor devices with unique properties. "

Dr Misaki Sato led AIST's team to use the system to deposit high quality graphene with defined layers. This will be a major step in the manufacture of low voltage CMOS FET processing technology, enabling it to operate at voltages below 0.3 volts.

The study of leading innovation and technology R & D funds plan by the world (Funding Program for World-Leading Innovative R&D on Science and Technology, referred to as FIRST), which aims to encourage the advanced science and technology research and development, to enhance the international competitiveness of Japan, and through the sharing of research results, make a contribution to society and the well-being of the people. The FIRST program was approved by the government's Cabinet Office in 2009. It was jointly operated by the Cabinet Office of the Japanese government and the Japan Society for the promotion of science. Green nano electronic research center team the wafer processing research institute cooperation in the research of AIST (Green NanoELectronics Center), belonging to the FIRST program "green nano electronic core technology research and development project (core researcher: Yokoyama Naoki (Naoki Yokoyama) Dr.) part. Founded in April 2010, the center for green Nano Electronics is composed of researchers from academia and industry.