AoShi Technology completed over 100 million yuan in Series B financing, and the industrialization of Micro OLED/LED new photolithography process accelerated

Recently, Guangzhou AoShi Technology Co., Ltd. (hereinafter referred to as "AoShi"), a leader in China's new patterned lithography field, announced the completion of Series B financing of over 100 million yuan. This round of financing was jointly invested by a number of strategic investors and well-known industrial funds. The funds raised will be used primarily to build a K2 factory capable of processing 60,000 12-inch wafers per year and accelerate the industrialization of new patterning processes in the fields of Micro OLED (silicon-based OLED) and Micro LED.

Based on the latest developments in the industry, the manufacturing process of silicon-based OLED has converged to two technical paths: white light + color film (WOLED) and metal-free mask patterned lithography. The former is represented by Japan's Sony and the newly launched Hefei Vision, and the latter is represented by South Korea's Samsung and Guangzhou Olympic Games. In addition, the 8.6-generation line built by Visionox in Hefei also uses metal-free mask patterning lithography technology. There are currently multiple technology paths for Micro LED, among which quantum dots and vertical stacking technology solutions, which are the most promising in the market, both use a new patterning lithography process for 12-inch wafers.

It is worth noting that in the past, patterned lithography processes were mainly used for metal and inorganic etching in the field of semiconductor manufacturing. However, new patterned lithography processes have developed very rapidly in recent years. For example, the metal-free mask patterning process mentioned above essentially belongs to the category of organic patterning lithography technology. Its application scope has expanded from new displays to key AI-related semiconductor process layers such as advanced packaging, HBM, and CPO. New technologies such as heterogeneous patterning lithography have also been derived.

Image source: Paixin.com genuine gallery

The new patterned lithography is not a replacement for the traditional semiconductor lithography process, but unlocks the limitations of the traditional semiconductor lithography process. The development direction of traditional semiconductor lithography technology is to support more advanced processes, while new semiconductor technologies such as storage and computing integration, ultra-high bandwidth, and 2.5D/3D packaging have put forward different path requirements for the manufacturing process.

The booming semiconductor organic and heterogeneous patterning lithography technology uses innovative process materials and process materials to support new device structures, etching objects, substrate materials and substrate sizes, effectively meeting the continuous upgrade of semiconductor manufacturing processes. At the same time, the development of new patterning lithography processes driven by the demand for AI computing power has also brought important development opportunities to China’s semiconductor process, equipment, materials and testing manufacturers.

It is understood that AoShi's production line planning covers the industrialization of new semiconductor patterning lithography processes in multiple fields such as Micro OLED/LED and advanced packaging. Among them, the K2 factory is planned to be completed and put into production in Q4 of 2027. It will mainly produce second-generation silicon-based OLED screens with brightness up to 20,000 nits and advanced packaging RDL carrier boards.

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